A hydroponic experiment was conducted to investigate bioaccumulation and photosynthetic activity response to Cd in sweet sorghum seedlings. The seedlings were treated with 0, 50, and 100 μM Cd for 15 d. Our results showed that morphological characteristics of sweet sorghum were significantly affected by Cd treatments. The Cd concentrations in roots and shoots increased with increasing Cd concentrations in the nutrition solution; higher Cd accumulation was observed in the roots. Meanwhile, the photosynthetic activity decreased significantly and a shape of chlorophyll (Chl) a fluorescence transient in leaves was altered by Cd treatments. The Chl contents in the leaves decreased significantly, which was demonstrated by a change of spectral reflectance. Our data indicated that the higher Cd concentration reduced Chl contents and inhibited electron transport in the leaves, leading to the decrease of photosynthetic activity., Z. C. Xue, J. H. Li, D. S. Li, S. Z. Li, C. D. Jiang, L. A. Liu, S. Y. Wang, W. J. Kang., and Obsahuje bibliografii
In Mediterranean habitats, the specialist butterfly Euphydryas aurinia oviposits on Lonicera implexa. Previous work has shown that ovipositing females select and lay a higher number of egg clusters on certain plants. In this paper the results of a field study aimed at assessing whether females use plant size and/or plant or leaf greenness (i.e., chlorophyll concentrations) as cues for oviposition are described. Size of plants did not appear to be an important factor in determining host plant selection, probably because even small plants provide enough resources for the young larvae to reach the diapausing stage and because last instar larvae, the most likely to face resource depletion, can move great distances in search of food. Measurements of both spectral reflectance and chlorophyll concentration of plants failed to reveal differences between host and non-host plants. On the other hand, reflectance and chlorophyll concentration of leaves were found to be important in oviposition choice as egg clusters were generally located on the greenest leaves with the highest chlorophyll contents. This suggests that females use visual cues to select the leaves that will provide optimal growth opportunities for newly hatched larvae. Although there was some indication that plants receiving a greater number of egg clusters also had more leaves of high chlorophyll content, multiple egg batches on single plants could also be a consequence of females being attracted by the presence of conspecific egg clusters.
The correlation between dorsal wing colours and spectral sensitivity of the compound eyes of 13 species of thecline butterflies, consisting of 8 sexually monomorphic and 5 dimorphic species, was investigated. Spectral reflectance of the dorsal surfaces of the wings was measured using a spectrophotometer and spectral sensitivities using electroretinography. All 13 species examined showed a common basic pattern of spectral sensitivity with a primary peak at a wavelength of 440–460 nm. Detailed analyses of the deviations in sensitivity from the basic pattern revealed a correlation in monomorphic species with conspicuous wing hues, especially in males., Michio Imafuku., and Obsahuje seznam literatury
This paper deals with an alternative method to determine the thickness of a thin film on a substrate. A linear relation between the thin-film thickness and the wavelength of the reflectance spectrum tangent to the envelope function for specific interference order is revealed in a wide wavelength range. This relation enables the calculation of the thickness provided that the wavelength-dependent optical parameters of the thin film and the substrate are known. The methods allow to calculate the thickness from the reflectance spectrum in a narrow range close to one extreme only as demonstrated both theoretically and experimentally for Sio2 thin-films on Si substrates. The results are discussed for two wavelength ranges and compared with those obtained by the algebraic fitting method. and Práce prezentuje metodu určení tloušťky tenké vrstvy z měření spektrální odrazivosti s využitím nové varianty obálkové metody. Byl nalezen lineární vztah mezi vlnovou délkou tečny spektrální odrazivosti k obálkové funkci a odpovídající tloušťkou tenké vrstvy pro daný interferenční řád v širokém spektrálním oboru. Tento lineární vztah umožňuje výpočet tloušťky vrstvy na základě známých spektrálních optických parametrů vrstvy a podložky. Metoda umožňuje výpočet tloušťky ze znalosti pouze malé části spektra v okolí jednoho extrému, jak je demonstrováno teoreticky a experimentálně na systému SiO2 - Si. Výsledky jsou porovnány s hodnotami, získanými algebraickou fitovací metodou.
This paper presents the effect of various reflectance models of the thin-film structure system on determination of the thin-film thickness. A special program was created in software package Matlab, which is able to calculate theoretical spectral reflectance in selected wavelength interval for the certain thin-film thickness. Afterwards, this reflectance, which simulates experimental reflectance during the following study, is processed by other program in Matlab. In this way the simulated reflectance is fitted to theoretical one with thin-film thickness as fitted parameter. Different combinations of optical parameters - dispersive and non-dispersive - for the thin-film structure system can be used as the input for the program files in the fitted reflection spectrum. Finally, the effect of reflectance models on the value of the thin-film thickness is discussed. and Práce prezentuje vliv použití různých modelů odrazivosti systému tenká vrstva - podložka na vypočtení tloušťky tenké vrstvy. V prostředí Matlabu je vytvořen program, který pomocí obecného modelu vypočte teoretický průběh spektrální odrazivosti v závislosti na vlnové délce pro zvolenou tloušťku tenké vrstvy. Takto vypočtená odrazivost, která v další fázi studia simuluje naměřenou odrazivost, je zpracována dalším programem v Matlabu, který simulované (naměřené) reflexní spektrum fituje spektrem teoretickým, kde fitovaným parametrem je tloušťka vrstvy. Ve vstupních souborech fitovaného teoretického reflexního spektra jsou použity různé kombinace disperzních a nedisperzních optických parametrů systému tenká vrstva - podložka a je sledován jejich vliv na hodnotu vypočtené tloušťky tenké vrstvy.