As a common tree species in northern China, Populus × euramericana "Neva" has an important practical value for the study of continuous cropping obstacles in poplar cultivation. Plant allelopathy is the main reason for continuous cropping obstacles, which are caused by allelochemicals, such as para-hydroxybenzoic acid (p-HB). The objective of this study was to investigate the effects of p-HB on the photosynthesis of poplar. Photosynthetic parameters of Populus × euramericana "Neva" poplar were determined in a pot culture experiment where five p-HB concentrations were used (0, 1, 2, 4, and 6 mmol L−1). Each seedling was treated with 4 L of p-HB solution every seven days, ten times in total. p-HB inhibited the photosynthesis of poplar significantly, as shown by a clear decline in the net photosynthetic rate. Our results indicated nonstomatal limitation responsible for the photosynthesis reduction., G. T. Liang, S. Y. Zhang, J. Guo, R. Yang, H. Li, X. C. Fang, G. C. Zhang., and Obsahuje bibliografii
The effects of various concentrations of bensulfuron-methyl residues (BSM, 0-500 μg kg-1) on the growth and photosynthesis of soybean and peanut were studied. Shoot length, root length, root-to-shoot ratio, and biomass of soybean and peanut seedlings declined with the increase of BSM residue concentrations. As the concentration of BSM increased, SPAD value, net photosynthetic rate, stomatal limitation, stomatal conductance, and transpiration rate also declined with varying extent, but dark respiration rate and intercellular CO2 concentration increased gradually. PSII maximum quantum yield, actual quantum yield, and electron transport rate were significantly reduced by the BSM residues in soil, and the reduction was mostly attributed to the decrease in photochemical quenching coefficient. The results showed that photosynthesis in both crops was limited by nonstomatal factors. The residues of BSM caused reversible damage in PSII reaction centers and decrease the proportion of available excitation energy used for photochemistry., W. C. Su, L. L. Sun, Y. H. Ge, R. H. Wu, H. L. Xu, C. T. Lu., and Obsahuje bibliografii